Analyzing electrostatic induced damage risk to reticles with an in situ e-reticle system

Richard Tu; Thomas Sebald

doi:10.1117/12.837039

11 December 2009 Analyzing electrostatic induced damage risk to reticles with an in situ e-reticle system

Richard Tu, Thomas Sebald

Proceedings Volume 7520, Lithography Asia 2009; 752015 (2009) https://doi.org/10.1117/12.837039
Event: SPIE Lithography Asia, 2009, Taipei, Taiwan

Abstract

E-Reticle^™ system is an electrostatic field test device, which has the form factor of a conventional six inch quartz production reticle. The E-Reticle was used to assess the ESD damage risks in a mask cleaning tool. Test results indicate that a reticle may see higher than ITRS recommended electrostatic potential specifications when mechanical operations and cold DIW rinse start and in progress, hence seeing increased probability of electrostatic induced damages.

Citation Download Citation

Richard Tu and Thomas Sebald "Analyzing electrostatic induced damage risk to reticles with an in situ e-reticle system", Proc. SPIE 7520, Lithography Asia 2009, 752015 (11 December 2009); https://doi.org/10.1117/12.837039

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available