11 December 2009 Analyzing electrostatic induced damage risk to reticles with an in situ e-reticle system
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Proceedings Volume 7520, Lithography Asia 2009; 752015 (2009) https://doi.org/10.1117/12.837039
Event: SPIE Lithography Asia, 2009, Taipei, Taiwan
Abstract
E-Reticle system is an electrostatic field test device, which has the form factor of a conventional six inch quartz production reticle. The E-Reticle was used to assess the ESD damage risks in a mask cleaning tool. Test results indicate that a reticle may see higher than ITRS recommended electrostatic potential specifications when mechanical operations and cold DIW rinse start and in progress, hence seeing increased probability of electrostatic induced damages.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Richard Tu, Richard Tu, Thomas Sebald, Thomas Sebald, "Analyzing electrostatic induced damage risk to reticles with an in situ e-reticle system", Proc. SPIE 7520, Lithography Asia 2009, 752015 (11 December 2009); doi: 10.1117/12.837039; https://doi.org/10.1117/12.837039
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