MEMS (Micro Electro Mechanical systems) technology has been widely employed for micro device fabrication.
Polymer materials, such as photoresist resin, have been focused as permanent structural materials used for MEMS. It is
required that the permanent structural materials are durable to employ to micro device component. We demonstrate that
the mechanical strength of self-standing resist film is enhanced by forming hexagonal hole array. The destruction
strength of the resist film is analyzed by peel destruction test. As a result, the enhancement of the self-standing resist film
with patterning can be obtained.