14 December 2009 Dissolved gas quantification and bubble formation in liquid chemical dispense
Author Affiliations +
Proceedings Volume 7520, Lithography Asia 2009; 752039 (2009) https://doi.org/10.1117/12.852209
Event: SPIE Lithography Asia, 2009, Taipei, Taiwan
Gas dissolved in liquids such as photoresist comes out of solution as bubbles after the liquid experiences a pressure drop in a dispense train and may cause on-wafer defects. Reservoirs in the dispense train can assist in removing bubbles but are incapable of effectively removing dissolved gas. This study demonstrates the importance of maintaining the amount of dissolved gas in a liquid below a critical value to reduce bubbles generated after a pressure drop in the dispense train occurs. The methodology used to quantify dissolved gas during liquid dispense cycle using gas chromatography is discussed. The amount of dissolved gas is correlated to the amount of bubbles downstream of a pressure drop. This study also analyzes sources of bubbles in the dispense train and techniques to mediate the sources.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Glenn Tom, Glenn Tom, Wei Liu, Wei Liu, } "Dissolved gas quantification and bubble formation in liquid chemical dispense", Proc. SPIE 7520, Lithography Asia 2009, 752039 (14 December 2009); doi: 10.1117/12.852209; https://doi.org/10.1117/12.852209

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