Manufacturing of diffraction-quality optical elements for high-resolution optical systems

N. I. Chkhalo; A. E. Pestov; N. N. Salashchenko; M. N. Toropov

doi:10.1117/12.854325

26 February 2010 Manufacturing of diffraction-quality optical elements for high-resolution optical systems

N. I. Chkhalo, A. E. Pestov, N. N. Salashchenko, M. N. Toropov

Author Affiliations +

Proceedings Volume 7521, International Conference on Micro- and Nano-Electronics 2009; 752104 (2010) https://doi.org/10.1117/12.854325
Event: International Conference on Micro- and Nano-Electronics 2009, 2009, Zvenigorod, Russian Federation

Abstract

The paper is devoted to the fundamental problems of manufacturing and testing substrates with fine precision for multilayer mirrors which surface shape, as a rule, is an aspherical one and that should be made with a sub-nanometer precision, to characterizing multilayer covers deposited onto these substrates and also to measuring with the subnanometer accuracy the wave-front aberrations of high-aperture optical projective objectives. A particular attention has been given to interferometers with a diffraction reference wave. Last experimental results on aberrations of the reference spherical wave of a source based on a single mode tipped fiber with a sub-wave exit aperture are presented. The application of this interferometer for characterizing aspherical convex optical surfaces and wave-front aberrations of optical systems is illustrated. Resent results on correcting the optical element surfaces are presented. Some peculiarities of the deposition technology as applied to the mirrors with ultra-high precision surface shape are discussed.

Citation Download Citation

N. I. Chkhalo, A. E. Pestov, N. N. Salashchenko, and M. N. Toropov "Manufacturing of diffraction-quality optical elements for high-resolution optical systems", Proc. SPIE 7521, International Conference on Micro- and Nano-Electronics 2009, 752104 (26 February 2010); https://doi.org/10.1117/12.854325

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