Paper
31 December 2010 Fabrication and application of diffractive optical elements
Author Affiliations +
Proceedings Volume 7544, Sixth International Symposium on Precision Engineering Measurements and Instrumentation; 75443L (2010) https://doi.org/10.1117/12.887434
Event: Sixth International Symposium on Precision Engineering Measurements and Instrumentation, 2010, Hangzhou, China
Abstract
The fabrication methods of binary and continuous-relief diffractive optical elements (DOE) by direct laser writing and lithography are analyzed. Laser metrology often requires the precision forming of a probe laser beam. This problem is solved optimally by application of DOEs. A number of scientific and practical applications require the fabrication of DOEs to create highly accurate aspherical wavefronts. This paper reviews the research directed toward the creation of equipment and technologies for DOEs with a binary, multilevel, and continuous profile. The results of the practical applications of DOEs (fabricated in Institute of Automation and Electrometry SB RAS) in optical measuring systems are presented.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. G. Poleshchuk "Fabrication and application of diffractive optical elements", Proc. SPIE 7544, Sixth International Symposium on Precision Engineering Measurements and Instrumentation, 75443L (31 December 2010); https://doi.org/10.1117/12.887434
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KEYWORDS
Diffractive optical elements

Photomasks

Binary data

Laser systems engineering

Lithography

X-rays

Multiphoton lithography

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