A design of beam shaping unit for 193nm lithography illumination system using angular spectrum theory

Yang Zhao; Yan Gong; Shun Li; Wei Zhang

doi:10.1117/12.885296

31 December 2010 A design of beam shaping unit for 193nm lithography illumination system using angular spectrum theory

Yang Zhao, Yan Gong, Shun Li, Wei Zhang

Proceedings Volume 7544, Sixth International Symposium on Precision Engineering Measurements and Instrumentation; 75443Z (2010) https://doi.org/10.1117/12.885296
Event: Sixth International Symposium on Precision Engineering Measurements and Instrumentation, 2010, Hangzhou, China

Abstract

Off-axis illumination (OAI) technology is widely used to enhance resolution for deep ultraviolet lithography. The realizing methods of OAI include geometrical optics method and physical optics method. However, the former has the disadvantage of weak intensity distribution controlling ability, and the latter introduces simulation errors evidently when dealing with near field diffraction propagation. A diffractive optical element (DOE) designing method using plane wave angular spectrum theory is presented in this paper. Several kinds of OAI modes at near field away from DOE can be realized, and simulation errors and the size of illuminator are also reduced. According to studying the relationships of the sampling point distance of DOE, light beam propagation distance, and the structure of the beam shaping unit, a method of determining the designing parameters is discussed. Using this method, several illumination modes are realized, and simulation results show that all diffraction efficiencies reach up to 84%. The method of DOE manufacturing is analyzed at last, and it is proven to be feasible.

Citation Download Citation

Yang Zhao, Yan Gong, Shun Li, and Wei Zhang "A design of beam shaping unit for 193nm lithography illumination system using angular spectrum theory", Proc. SPIE 7544, Sixth International Symposium on Precision Engineering Measurements and Instrumentation, 75443Z (31 December 2010); https://doi.org/10.1117/12.885296

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