Modeling and simulation of through-focus images for dimensional analysis of nanoscale structures

Xiuguo Chen; Shiyuan Liu; Chuanwei Zhang; Yuan Ma; Jinlong Zhu

doi:10.1117/12.885232

31 December 2010 Modeling and simulation of through-focus images for dimensional analysis of nanoscale structures

Xiuguo Chen, Shiyuan Liu, Chuanwei Zhang, Yuan Ma, Jinlong Zhu

Proceedings Volume 7544, Sixth International Symposium on Precision Engineering Measurements and Instrumentation; 75446C (2010) https://doi.org/10.1117/12.885232
Event: Sixth International Symposium on Precision Engineering Measurements and Instrumentation, 2010, Hangzhou, China

Abstract

In this paper, the through-focus scanning technique using a conventional bright-field optical microscope is introduced for nanoscale dimensional analysis with nanometer sensitivity. This technique uses a set of through-focus image maps (TFIMs) obtained at different focus positions instead of one 'best-focus' image and considers the through-focus image as a unique 'signal' that represents the target. The boundary element method (BEM) and the rigorous coupled-wave analysis (RCWA) method were applied to simulate the optical responses and to obtain the TFIMs of finite aperiodic and infinite periodic structures, respectively. The sensitivity of the through-focus technique for the nanoscale dimensional changes of targets was analyzed by using the differential through-focus image maps (DTFIMs). The simulation results validate the use of this technique for nanoscale metrology.

Citation Download Citation

Xiuguo Chen, Shiyuan Liu, Chuanwei Zhang, Yuan Ma, and Jinlong Zhu "Modeling and simulation of through-focus images for dimensional analysis of nanoscale structures", Proc. SPIE 7544, Sixth International Symposium on Precision Engineering Measurements and Instrumentation, 75446C (31 December 2010); https://doi.org/10.1117/12.885232

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KEYWORDS

Binary data

Metrology

Chemical elements

Fused deposition modeling

Magnetism

Diffraction

Silicon

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