31 December 2010 Modeling and simulation of through-focus images for dimensional analysis of nanoscale structures
Author Affiliations +
Proceedings Volume 7544, Sixth International Symposium on Precision Engineering Measurements and Instrumentation; 75446C (2010) https://doi.org/10.1117/12.885232
Event: Sixth International Symposium on Precision Engineering Measurements and Instrumentation, 2010, Hangzhou, China
Abstract
In this paper, the through-focus scanning technique using a conventional bright-field optical microscope is introduced for nanoscale dimensional analysis with nanometer sensitivity. This technique uses a set of through-focus image maps (TFIMs) obtained at different focus positions instead of one 'best-focus' image and considers the through-focus image as a unique 'signal' that represents the target. The boundary element method (BEM) and the rigorous coupled-wave analysis (RCWA) method were applied to simulate the optical responses and to obtain the TFIMs of finite aperiodic and infinite periodic structures, respectively. The sensitivity of the through-focus technique for the nanoscale dimensional changes of targets was analyzed by using the differential through-focus image maps (DTFIMs). The simulation results validate the use of this technique for nanoscale metrology.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xiuguo Chen, Shiyuan Liu, Chuanwei Zhang, Yuan Ma, Jinlong Zhu, "Modeling and simulation of through-focus images for dimensional analysis of nanoscale structures", Proc. SPIE 7544, Sixth International Symposium on Precision Engineering Measurements and Instrumentation, 75446C (31 December 2010); doi: 10.1117/12.885232; https://doi.org/10.1117/12.885232
PROCEEDINGS
9 PAGES


SHARE
Back to Top