15 May 2010 Checkerboard pattern for PSF parameter determination in electron beam lithography
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Proceedings Volume 7545, 26th European Mask and Lithography Conference; 754507 (2010) https://doi.org/10.1117/12.864315
Event: 26th European Mask and Lithography Conference, 2010, Grenoble, France
Abstract
In electron beam lithography, the electron scattering and the corresponding proximity effect highly influence the feature resolution. Especially for sub-100 nm features a compensation for this effect is needed. There are several methods of determination of the proximity parameters, which mostly are time-consuming and complex due to a need of an initial proximity effect correction and immense measurement effort. In this paper the checkerboard pattern is proposed to provide the opportunity for proximity parameter determination in a fast and easy manner without using a sophisticated CD-SEM metrology. The concept is illustrated by simulation and first experimental results are shown.
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Manuela Gutsch, Manuela Gutsch, Kang-Hoon Choi, Kang-Hoon Choi, Martin Freitag, Martin Freitag, Marc Hauptmann, Marc Hauptmann, Christoph Hohle, Christoph Hohle, Philipp Jaschinsky, Philipp Jaschinsky, Katja Keil, Katja Keil, } "Checkerboard pattern for PSF parameter determination in electron beam lithography", Proc. SPIE 7545, 26th European Mask and Lithography Conference, 754507 (15 May 2010); doi: 10.1117/12.864315; https://doi.org/10.1117/12.864315
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