15 May 2010 Checkerboard pattern for PSF parameter determination in electron beam lithography
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Proceedings Volume 7545, 26th European Mask and Lithography Conference; 754507 (2010) https://doi.org/10.1117/12.864315
Event: 26th European Mask and Lithography Conference, 2010, Grenoble, France
Abstract
In electron beam lithography, the electron scattering and the corresponding proximity effect highly influence the feature resolution. Especially for sub-100 nm features a compensation for this effect is needed. There are several methods of determination of the proximity parameters, which mostly are time-consuming and complex due to a need of an initial proximity effect correction and immense measurement effort. In this paper the checkerboard pattern is proposed to provide the opportunity for proximity parameter determination in a fast and easy manner without using a sophisticated CD-SEM metrology. The concept is illustrated by simulation and first experimental results are shown.
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Manuela Gutsch, Manuela Gutsch, Kang-Hoon Choi, Kang-Hoon Choi, Martin Freitag, Martin Freitag, Marc Hauptmann, Marc Hauptmann, Christoph Hohle, Christoph Hohle, Philipp Jaschinsky, Philipp Jaschinsky, Katja Keil, Katja Keil, "Checkerboard pattern for PSF parameter determination in electron beam lithography", Proc. SPIE 7545, 26th European Mask and Lithography Conference, 754507 (15 May 2010); doi: 10.1117/12.864315; https://doi.org/10.1117/12.864315
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