Deep-UV KrF lithography for the fabrication of Bragg gratings on SOI rib waveguides

J. Bauer; D. Stolarek; L. Zimmermann; I. Giuntoni; U. Haak; H. Richter; S. Marschmeyer; A. Gajda; J. Bruns; K. Petermann; B. Tillack

doi:10.1117/12.863538

15 May 2010 Deep-UV KrF lithography for the fabrication of Bragg gratings on SOI rib waveguides

J. Bauer, D. Stolarek, L. Zimmermann, I. Giuntoni, U. Haak, H. Richter, S. Marschmeyer, A. Gajda, J. Bruns, K. Petermann, B. Tillack

Author Affiliations +

Proceedings Volume 7545, 26th European Mask and Lithography Conference; 75450L (2010) https://doi.org/10.1117/12.863538
Event: 26th European Mask and Lithography Conference, 2010, Grenoble, France

Abstract

In this Paper we present a deep ultra-violet lithography (248nm) based double patterning technique for the fabrication of Bragg gratings on SOI rib waveguides. The principle of the used double patterning technique is presented, as well the influence of the process variation on the device performances. The influence of the overlay error was identified as a possibly limiting factor for the application of this technique. Usable structures were realized, in spite of small overlay error and non-rectangular grating profile. The optical characterization showed that the presented technique is capable to provide high performance Si waveguides and Bragg gratings.

Citation Download Citation

J. Bauer, D. Stolarek, L. Zimmermann, I. Giuntoni, U. Haak, H. Richter, S. Marschmeyer, A. Gajda, J. Bruns, K. Petermann, and B. Tillack "Deep-UV KrF lithography for the fabrication of Bragg gratings on SOI rib waveguides", Proc. SPIE 7545, 26th European Mask and Lithography Conference, 75450L (15 May 2010); https://doi.org/10.1117/12.863538

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