15 May 2010 Template masters for substrate conformal imprint lithography generated by charged particle nanopatterning techniques
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Proceedings Volume 7545, 26th European Mask and Lithography Conference; 75450S (2010) https://doi.org/10.1117/12.863198
Event: 26th European Mask and Lithography Conference, 2010, Grenoble, France
Substrate Conformal Imprint Lithography (SCIL™), developed within Philips Research, is a large area replication technology, which allows flexible nano-imprinting, even around defects. It uses templates (stamps) with a high modulus poly(dimethyl)siloxane (PDMS) pattern layer bonded onto a glass sheet with a low modulus PDMS intermediary layer. This template sheet is attached to a grooved vacuum plate. By sequentially pressurizing and evacuating the grooves, controlled contact with the resist layer and smooth release after resist curing can be established. The PDMS stamps are cast from a nanostructured silicon wafer, which serves as the template master. Charged Particle Nanopatterning (CHARPAN) techniques based on ion multi-beam projection techniques, establish a promising route for generating such nanometer resolution template masters. 2D structures have been written in the CHARPAN tool using Hydrogen (H3+) ions in a high resolution negative tone e-beam resist, Hydrogen Silsesquioxane (HSQ). The CHARPAN tool can also be operated with heavier sputter ions (Ar+, Xe+ etc.) enabling maskless and resistless 3D direct nanopatterning of a silicon template master. CHARPAN generated 2D and 3D template masters, the PDMS stamps cast from these masters and the resulting SCIL imprinted structures, show that at least a 20 nm resolution is feasible for this particular combination of technologies. The combination of CHARPAN and SCIL opens up new possibilities for low cost, fast and flexible 2D and 3D manufacturing of nano-devices in several application fields, e.g. in life sciences related test structures and devices.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Falco van Delft, Falco van Delft, Robert van de Laar, Robert van de Laar, Marc Verschuuren, Marc Verschuuren, Elmar Platzgummer, Elmar Platzgummer, Hans Loeschner, Hans Loeschner, } "Template masters for substrate conformal imprint lithography generated by charged particle nanopatterning techniques", Proc. SPIE 7545, 26th European Mask and Lithography Conference, 75450S (15 May 2010); doi: 10.1117/12.863198; https://doi.org/10.1117/12.863198

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