Highly reliable 198-nm light source for semiconductor inspection based on dual fiber lasers

Shinichi Imai; Kazuto Matsuki; Nobutaka Kikuiri; Katsuhiko Takayama; Osamu Iwase; Yoshiharu Urata; Tatsuya Shinozaki; Yoshio Wada; Satoshi Wada

doi:10.1117/12.840467

17 February 2010 Highly reliable 198-nm light source for semiconductor inspection based on dual fiber lasers

Shinichi Imai, Kazuto Matsuki, Nobutaka Kikuiri, Katsuhiko Takayama, Osamu Iwase, Yoshiharu Urata, Tatsuya Shinozaki, Yoshio Wada, Satoshi Wada

Author Affiliations +

Proceedings Volume 7580, Fiber Lasers VII: Technology, Systems, and Applications; 75800H (2010) https://doi.org/10.1117/12.840467
Event: SPIE LASE, 2010, San Francisco, California, United States

Abstract

Highly reliable DUV light sources are required for semiconductor applications such as a photomask inspection. The mask inspection for the advanced devices requires the UV lightning wavelength beyond 200 nm. By use of dual fiber lasers as fundamental light sources and the multi-wavelength conversion we have constructed a light source of 198nm with more than 100 mW. The first laser is Yb doped fiber laser with the wavelength of 1064 nm; the second is Er doped fiber laser with 1560 nm. To obtain the robustness and to simplify the configuration, the fundamental lights are run in the pulsed operation and all wavelength conversions are made in single-pass scheme. The PRFs of more than 2 MHz are chosen as an alternative of a CW light source; such a high PRF light is equivalent to CW light for inspection cameras. The light source is operated described as follows. Automatic weekly maintenance within an hour is done if it is required; automatic monthly maintenance within 4 hours is done on fixed date per month; manufacturer's maintenance is done every 6 month. Now this 198 nm light sources are equipped in the leading edge photomask inspection machines.

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Shinichi Imai, Kazuto Matsuki, Nobutaka Kikuiri, Katsuhiko Takayama, Osamu Iwase, Yoshiharu Urata, Tatsuya Shinozaki, Yoshio Wada, and Satoshi Wada "Highly reliable 198-nm light source for semiconductor inspection based on dual fiber lasers", Proc. SPIE 7580, Fiber Lasers VII: Technology, Systems, and Applications, 75800H (17 February 2010); https://doi.org/10.1117/12.840467

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