25 February 2010 Surface-enhanced Raman scattering hot spot isolation using surface-enhanced multiphoton lithography
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Proceedings Volume 7589, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications X; 75890Q (2010); doi: 10.1117/12.842455
Event: SPIE LASE, 2010, San Francisco, California, United States
Abstract
In this Manuscript, we present the fabrication and spectroscopic characterization of a large-area surfaceenhanced Raman scattering (SERS) substrate, as well as a method for improving femtomole-level trace detection (109 molecules) using this substrate. Using multiphoton-induced exposure of a commercial photoresist, we physically limit the available molecular adsorption sites to only the electromagnetic "hot spots" on the substrate. This process prevents molecules from adsorbing to sites of weak SERS enhancement, while permitting adsorption to sites of extraordinary SERS enhancement. For a randomly adsorbed submonolayer of benzenethiol molecules the average Raman scattering cross-section of the processed sample is 27 times larger than that of an unprocessed SERS substrate.
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Eric D. Diebold, Paul Peng, Eric Mazur, "Surface-enhanced Raman scattering hot spot isolation using surface-enhanced multiphoton lithography", Proc. SPIE 7589, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications X, 75890Q (25 February 2010); doi: 10.1117/12.842455; https://doi.org/10.1117/12.842455
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KEYWORDS
Surface enhanced Raman spectroscopy

Photoresist materials

Raman spectroscopy

Molecules

Adsorption

Silver

Raman scattering

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