Integrated passive and active devices are the key components in current and future information technology.
In order to fulfill requirements in miniaturization for (integrated) optical or electronic devices, nano-scaled
materials with a good compatibility to high-resolution processing techniques are needed. According to these
requirements, multi-photon techniques attract much attention by providing a resolution far beyond the diffraction
limit. The patterning of the inorganic-organic hybrid polymers, which are synthesized by catalytically controlled
hydrolysis/polycondensation reactions, will be discussed with respect to the underlying photochemical processes.
Emphasis will be on the direct writing of structures using femtosecond laser pulses, making use of two- and
three-photon absorption (TPA/3PA) processes with visible or IR light, which also allows one to write arbitrary
3D structures. Due to the very sharp threshold fluence for these processes and its non-linear behavior, features
down to 100 nm can be realized by choosing a suitable combination of material formulation and patterning
parameters. Voxel arrays were written, whereas the resulting voxel sizes are compared to a growth model, and
the influence of radical diffusion and chain propagation is discussed. In order to determine the TPA cross-section
and to estimate the role of the photoinitiator, a z-scan experiment was realized. The initiators' cross-sections
will be correlated to the resulting voxel sizes.