Paper
12 February 2010 A metal-dielectric thin film with broadband absorption
Author Affiliations +
Proceedings Volume 7618, Emerging Liquid Crystal Technologies V; 761819 (2010) https://doi.org/10.1117/12.843067
Event: SPIE OPTO, 2010, San Francisco, California, United States
Abstract
We propose and demonstrate a metal-dielectric thin film that delivers low reflection and high absorption over the entire visible spectrum. This thin black film consists of SiO2/Cr/SiO2/Al layers deposited on glass substrate. Measured reflectance and absorptance of the black film are 0.7% and 99.3%, respectively, when averaged over the range 380-780 nm. The total thickness of the black film is only about 220 nm. This thin black film can be used as a thin absorbing layer for displays that require both broadband anti-reflection and high contrast characteristics.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sang-Hwan Cho, Ju-Hyung Kang, Min-Kyo Seo, Jin-Kyu Yang, Sung-Yong Kang, and Yong-Hee Lee "A metal-dielectric thin film with broadband absorption", Proc. SPIE 7618, Emerging Liquid Crystal Technologies V, 761819 (12 February 2010); https://doi.org/10.1117/12.843067
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Cited by 2 scholarly publications.
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KEYWORDS
Metals

Thin films

Reflectivity

Chromium

Reflection

Silica

Aluminum

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