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22 March 2010Phosphor-filled micro-well arrays for digital x-ray imaging: effects of surface treatments
We are developing pixel-structured scintillators for the eventual purpose of high-resolution and high-sensitivity x-ray
imaging applications. The pixel-structured scintillators were fabricated by filling Gd2O2S:Tb phosphor powder into the
silicon micro-well arrays by using a simple sedimentation method. The micro-well arrays having a depth of 180 μm were
fabricated by deep reactive ion etching of silicon wafers. To enhance the optical gain and the Swank noise factor, we
applied reflectance at the inside wall surfaces. Two different
inside-surface treatments were applied; 0.2-μm-thick
titanium which has 70% reflectance and 1-μm-thick silicon dioxide which was grown by thermal oxidation. The imaging
performance was evaluated in terms of modulation-transfer function (MTF), noise-power spectrum (NPS), and detective
quantum efficiency (DQE). Compared with the commercial phosphor screen as a reference, much enhanced MTF results
were measured. However, very low values of the system gain due to trapping of the generated optical photons at the wall
surfaces give rise to the poorer DQE performance rather than that of the reference detector. The theoretical cascaded
model analysis estimates much improved DQE performances with improved design parameters, such as higher
reflectance of 90% at the wall surfaces.
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Seungman Yun, Chang Hwy Lim, Tae Woo Kim, Ian Cunningham, Thorsten Achterkirchen, Ho Kyung Kim, "Phosphor-filled micro-well arrays for digital x-ray imaging: effects of surface treatments," Proc. SPIE 7622, Medical Imaging 2010: Physics of Medical Imaging, 76223S (22 March 2010);