18 March 2010 Optics for EUV production
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Proceedings Volume 7636, Extreme Ultraviolet (EUV) Lithography; 763603 (2010); doi: 10.1117/12.848624
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States
Abstract
In 2005, Carl Zeiss SMT AG has shipped two sets of Optics for ASML's Alpha Demo Tools. This was the starting point for the introduction of full field EUV systems. Meanwhile imaging down to 25 nm was demonstrated with the ADT tools. Based on the learning from these tools ASML has built the NXE platform - a multi-generation EUV production platform. Shipping in 2010, the NXE:3100 will be the first generation of the EUV exposure platform. We review the current status of EUV optics production for the NXE:3100 tools. Four optical systems of the 3100 series have been shipped so far. These sets of optics are characterized by significantly lower flare and wave-front levels compared to the ADT. In addition a new illumination system with higher partial coherence has been developed. In this paper we focus on mirror fabrication and at wavelength qualification results of the optical systems produced so far. We also will give an outline of the next generation, a 0.32NA exposure tool including EUVL off-axis illumination for resolutions down to 16nm. We take the expected imaging requirements as a starting point and compare it with the current status of our technology development. A brief overview for further tool extensions by higher NA will be given as well.
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Martin Lowisch, Peter Kuerz, Hans-Juergen Mann, Oliver Natt, Bernd Thuering, "Optics for EUV production", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 763603 (18 March 2010); doi: 10.1117/12.848624; https://doi.org/10.1117/12.848624
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KEYWORDS
Mirrors

Extreme ultraviolet

Projection systems

EUV optics

Optics manufacturing

Extreme ultraviolet lithography

Reticles

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