EUV source development for AIMS and blank inspection

Paul A. Blackborow; Matthew J. Partlow; Stephen F. Horne; Matthew M. Besen; Donald K. Smith; Deborah Gustafson

doi:10.1117/12.846559

17 March 2010 EUV source development for AIMS and blank inspection

Paul A. Blackborow, Matthew J. Partlow, Stephen F. Horne, Matthew M. Besen, Donald K. Smith, Deborah Gustafson

Proceedings Volume 7636, Extreme Ultraviolet (EUV) Lithography; 763609 (2010) https://doi.org/10.1117/12.846559
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

With EUV Lithography readying for production, the need for commercially available actinic mask inspection tools is critical. A key to developing a successful tool is a reliable high brightness EUV light source. The Energetiq EQ-10 is a commercially available EUV light source, with demonstrated reliability of over 15 sources in the field. It is being used today for laboratory based actinic mask blank inspection at Selete⁴. Results will be presented from a program to optimize the EQ-10 for higher brightness. The platform used for this work is a new version of the EQ-10. The redesigned source demonstrates increased EUV power and brightness compared to the standard EQ-10. The program aims to optimize source operating conditions and pinch geometries of the new source to maximize brightness.

Citation Download Citation

Paul A. Blackborow, Matthew J. Partlow, Stephen F. Horne, Matthew M. Besen, Donald K. Smith, and Deborah Gustafson "EUV source development for AIMS and blank inspection", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 763609 (17 March 2010); https://doi.org/10.1117/12.846559

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