19 March 2010 Development and performance of grazing and normal incidence collectors for the HVM DPP and LPP sources
Author Affiliations +
Media Lario Technologies (MLT), leveraging off its unique in-field collector experience, has designed the Grazing Incidence Collector (GIC) for the Sn-fueled Discharge Produced Plasma (DPP) source developed by Philips Extreme UV (PEUV) and XTREME technologies (XT) for High Volume Manufacturing (HVM) deployment. The performance of the HVM GIC described in this work shows a point-source collection efficiency of 24%, and is enabled by an integrated thermal control system designed to ensure optical stability for an absorbed thermal load of 6 kW. The GIC reflective layer has been custom tailored to match the debris mitigation strategy developed and characterized by PEUV and XT, supporting at least a 1-year lifetime proposition of the source-collector module. Leveraging off the experience gained in GIC, MLT is developing the processes to manufacture the Normal Incidence Collector (NIC) for Laser Produced Plasma (LPP) sources. Using its proprietary disruptive replication technology by electroforming, MLT is developing thermal management designs for NIC enabling stable operation at room temperature. This work reports on the performance of (symbol) 150 mm thermally managed NIC demonstrators. The mirror substrates have been integrated with new proprietary thermal management designs that are well suited to the electroformed mirrors. We also report on the reflectivity of the Mo/Si multilayer coated mirror, achieving maximum reflectivity values of 62% and a center wavelength (FWHM) of 13.52 nm, which demonstrates acceptable performance in an LPP NIC application.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
G. Bianucci, A. Bragheri, G. L. Cassol, B. Johnson, M. Rossi, F. E. Zocchi, "Development and performance of grazing and normal incidence collectors for the HVM DPP and LPP sources", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76360C (19 March 2010); doi: 10.1117/12.846712; https://doi.org/10.1117/12.846712

Back to Top