Inspecting EUV mask blanks with a 193nm system

Stan Stokowski; Joshua Glasser; Gregg Inderhees; Phani Sankuratri

doi:10.1117/12.850825

20 March 2010 Inspecting EUV mask blanks with a 193nm system

Stan Stokowski, Joshua Glasser, Gregg Inderhees, Phani Sankuratri

Proceedings Volume 7636, Extreme Ultraviolet (EUV) Lithography; 76360Z (2010) https://doi.org/10.1117/12.850825
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Data and simulation results characterizing the capability of a DUV system to inspect EUV mask blanks and substrates are reported. Phase defects and particles on multilayer (ML) surfaces, ARC-coated absorber, and substrate material are considered. In addition to the previously reported results of inspecting phase defects on multilayer surfaces, phase defects on a quartz substrate surface are shown. The principle of phase detection is described. Simulations show that the 22-nm node requirement for phase defect detection should be met, assuming a reduction in the multilayer roughness. Initial inspections of deposited SiO₂ spheres show sensitivities of at least 40 nm on ML and quartz; however, the availability of calibrated spheres of smaller diameters has limited testing below this value. Simulation results show relative sensitivities for detecting SiO₂ spheres of different diameters on various EUV materials.

Citation Download Citation

Stan Stokowski, Joshua Glasser, Gregg Inderhees, and Phani Sankuratri "Inspecting EUV mask blanks with a 193nm system", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76360Z (20 March 2010); https://doi.org/10.1117/12.850825

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