For extreme ultraviolet light lithography to be a viable process for the future development of computer chips, it is
necessary that clean photons are produced at the intermediate focus (IF). To measure the flux at the IF, the Center
for Plasma-Material Interactiosn (CPMI) at the University of Illinois at Urbana-Champaign has developed a Sn IF
flux emission detector (SNIFFED) apparatus that is capable of measuring charged and neutral particle flux at the IF.
Results will be presented that diagnose debris produced at the IF, as well as methods by which this debris can be
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