EUV into production with ASML's NXE platform

Christian Wagner; Noreen Harned; Peter Kuerz; Martin Lowisch; Hans Meiling; David Ockwell; Rudy Peeters; Koen van Ingen-Schenau; Eelco van Setten; Judon Stoeldraijer; Bernd Thuering

doi:10.1117/12.845700

20 March 2010 EUV into production with ASML's NXE platform

Christian Wagner, Noreen Harned, Peter Kuerz, Martin Lowisch, Hans Meiling, David Ockwell, Rudy Peeters, Koen van Ingen-Schenau, Eelco van Setten, Judon Stoeldraijer, Bernd Thuering

Author Affiliations +

Proceedings Volume 7636, Extreme Ultraviolet (EUV) Lithography; 76361H (2010) https://doi.org/10.1117/12.845700
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

The NXE platform is a multi-generation EUV production platform that builds the technology, design and experience of both TWINSCAN™ and the two 0.25NA EUV tools (Alpha Demo Tools or ADT's) in use at two research centers for EUV process development. This paper reviews the EUV Industry status, presents recent imaging and device work carried out on the two 0.25NA ADT EUV tools and the status of the 1st production tool. Shipping in 2010, the NXE:3100 will be the 1st generation of the EUV exposure platform. With an NA of 0.25 and a productivity of 60wph this tool is targeted for EUV process implementation and early volume production at the 27nm node. We will highlight the key features of the NXE:3100. On our way towards shipment we describe the manufacturing status and performance data of optics, source and stages. The 0.32NA 2nd generation tool is designed as a lithography solution for high volume manufacturing with EUV at the 22nm node and below. With a productivity >125wph the NXE:3300 will be a cost effective solution for Lithography at the 22nm node and below. A 3rd generation with off-axis illumination at full transmission ensures extendibility of the NXE:3300 for resolutions down to 16nm.

Citation Download Citation

Christian Wagner, Noreen Harned, Peter Kuerz, Martin Lowisch, Hans Meiling, David Ockwell, Rudy Peeters, Koen van Ingen-Schenau, Eelco van Setten, Judon Stoeldraijer, and Bernd Thuering "EUV into production with ASML's NXE platform", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76361H (20 March 2010); https://doi.org/10.1117/12.845700

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