20 March 2010 EUV into production with ASML's NXE platform
Author Affiliations +
Abstract
The NXE platform is a multi-generation EUV production platform that builds the technology, design and experience of both TWINSCAN™ and the two 0.25NA EUV tools (Alpha Demo Tools or ADT's) in use at two research centers for EUV process development. This paper reviews the EUV Industry status, presents recent imaging and device work carried out on the two 0.25NA ADT EUV tools and the status of the 1st production tool. Shipping in 2010, the NXE:3100 will be the 1st generation of the EUV exposure platform. With an NA of 0.25 and a productivity of 60wph this tool is targeted for EUV process implementation and early volume production at the 27nm node. We will highlight the key features of the NXE:3100. On our way towards shipment we describe the manufacturing status and performance data of optics, source and stages. The 0.32NA 2nd generation tool is designed as a lithography solution for high volume manufacturing with EUV at the 22nm node and below. With a productivity >125wph the NXE:3300 will be a cost effective solution for Lithography at the 22nm node and below. A 3rd generation with off-axis illumination at full transmission ensures extendibility of the NXE:3300 for resolutions down to 16nm.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christian Wagner, Christian Wagner, Noreen Harned, Noreen Harned, Peter Kuerz, Peter Kuerz, Martin Lowisch, Martin Lowisch, Hans Meiling, Hans Meiling, David Ockwell, David Ockwell, Rudy Peeters, Rudy Peeters, Koen van Ingen-Schenau, Koen van Ingen-Schenau, Eelco van Setten, Eelco van Setten, Judon Stoeldraijer, Judon Stoeldraijer, Bernd Thuering, Bernd Thuering, } "EUV into production with ASML's NXE platform", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76361H (20 March 2010); doi: 10.1117/12.845700; https://doi.org/10.1117/12.845700
PROCEEDINGS
12 PAGES


SHARE
RELATED CONTENT

EUV lithography optics for sub-9nm resolution
Proceedings of SPIE (March 16 2015)
ASML's NXE platform performance and volume introduction
Proceedings of SPIE (April 01 2013)
Anamorphic high-NA EUV lithography optics
Proceedings of SPIE (September 04 2015)
First performance results of the ASML alpha demo tool
Proceedings of SPIE (March 22 2006)
Initial results from the EUV engineering test stand
Proceedings of SPIE (December 20 2001)

Back to Top