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20 March 2010 LPP source system development for HVM
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Abstract
Laser produced plasma (LPP) systems have been developed as a viable approach for the EUV scanner light source to support optical imaging of circuit features at sub-22nm and beyond nodes on the ITRS roadmap. This paper provides a review of development progress and productization status for LPP extreme-ultra-violet (EUV) sources with performance goals targeted to meet specific requirements from leading scanner manufacturers. The status of first generation High Volume Manufacturing (HVM) sources in production and of prototype source operation at a leading scanner manufacturer is discussed. The EUV power at intermediate focus is discussed and the lastest data is presented. An electricity consumption model is described, and our current product roadmap is shown.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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