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22 March 2010Stochastic simulation of photon scattering for EUV mask defect inspection
When EUV light is used to inspect mask defects, the reflective photons reveal information for both the mask structure
and the mask defects. The number of reflective photons has to be enough for generating sufficient detector signals. A
modeling technique based on Feynman path integral is utilized to calculate the number of reflective extreme-ultraviolet
(EUV) photons scattered from photomask surfaces. For a 2D semicircular silicon defect, the capability of predicting the
moving direction for each reemitting photon and the intensity of photons in different direction has been demonstrated.