Characterization of the polarization properties of PTB's EUV reflectometry system

Christian Laubis; Annett Kampe; Christian Buchholz; Andreas Fischer; Jana Puls; Christian Stadelhoff; Frank Scholze

doi:10.1117/12.845098

22 March 2010 Characterization of the polarization properties of PTB's EUV reflectometry system

Christian Laubis, Annett Kampe, Christian Buchholz, Andreas Fischer, Jana Puls, Christian Stadelhoff, Frank Scholze

Proceedings Volume 7636, Extreme Ultraviolet (EUV) Lithography; 76362R (2010) https://doi.org/10.1117/12.845098
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

The development of EUV lithography is critically based on the availability of suitable metrology equipment. To meet the industry's requirements, the Physikalisch-Technische Bundesanstalt (PTB) operates an EUV reflectometry facility at the electron storage ring BESSY II. It is designed for at-wavelength metrology of full-sized EUVL optics. A total uncertainty of 0.10% for peak reflectance is achieved with a reproducibility of 0.05% and a reproducibility of 1 pm for the centre wavelength. Measurements at PTB use almost linearly polarized radiation, whereas EUV lithography machines are operated with unpolarized sources and the status of polarization changes throughout the optical system. Therefore, to transfer these high-accuracy measurements to the EUV optical components under working conditions, it is essential to study the polarization dependence. We present a detailed characterization of the state of polarization for our EUV reflectometry system. We will discuss the uncertainties of PTB's reflectometry for large oblique angles with respect to the influence of polarization. An example of such measurements is the characterization of large 5 sr collector mirrors for LPP EUV sources, the largest EUV optical components presently available.

Citation Download Citation

Christian Laubis, Annett Kampe, Christian Buchholz, Andreas Fischer, Jana Puls, Christian Stadelhoff, and Frank Scholze "Characterization of the polarization properties of PTB's EUV reflectometry system", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76362R (22 March 2010); https://doi.org/10.1117/12.845098

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