22 March 2010 High reflectance multilayers for EUVL HVM-projection optics
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Abstract
Reported is a summary of multilayer deposition results by FOM on three elements of the projection optics of the ASML Extreme UV Lithography HVM tools. The coating process used is e-beam evaporation in combination with low-energy ion-beam smoothening. The reflectance of the coatings, which are covered with a special protective capping layer, is typically around 68%, with a maximum value of 69.6% and a non-correctable figure error added by the full multilayer stack of better than 35 picometer. The results are compared to the earlier coatings of the EUVL Process Development Tool.
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E. Louis, E. D. van Hattum, S. Alonso van der Westen, P. Sallé, K. T. Grootkarzijn, E. Zoethout, F. Bijkerk, G. von Blanckenhagen, S. Müllender, "High reflectance multilayers for EUVL HVM-projection optics", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76362T (22 March 2010); doi: 10.1117/12.846566; https://doi.org/10.1117/12.846566
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