22 March 2010 High reflectance multilayers for EUVL HVM-projection optics
Author Affiliations +
Reported is a summary of multilayer deposition results by FOM on three elements of the projection optics of the ASML Extreme UV Lithography HVM tools. The coating process used is e-beam evaporation in combination with low-energy ion-beam smoothening. The reflectance of the coatings, which are covered with a special protective capping layer, is typically around 68%, with a maximum value of 69.6% and a non-correctable figure error added by the full multilayer stack of better than 35 picometer. The results are compared to the earlier coatings of the EUVL Process Development Tool.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
E. Louis, E. Louis, E. D. van Hattum, E. D. van Hattum, S. Alonso van der Westen, S. Alonso van der Westen, P. Sallé, P. Sallé, K. T. Grootkarzijn, K. T. Grootkarzijn, E. Zoethout, E. Zoethout, F. Bijkerk, F. Bijkerk, G. von Blanckenhagen, G. von Blanckenhagen, S. Müllender, S. Müllender, } "High reflectance multilayers for EUVL HVM-projection optics", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76362T (22 March 2010); doi: 10.1117/12.846566; https://doi.org/10.1117/12.846566


Nikon EUVL development progress summary
Proceedings of SPIE (March 10 2006)
Development of an experimental EUVL system
Proceedings of SPIE (November 28 2007)
Subatomic accuracy in EUVL multilayer coatings
Proceedings of SPIE (May 20 2004)
Development of optics for EUV lithography tools
Proceedings of SPIE (March 15 2007)

Back to Top