22 March 2010 High reflectance multilayers for EUVL HVM-projection optics
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Reported is a summary of multilayer deposition results by FOM on three elements of the projection optics of the ASML Extreme UV Lithography HVM tools. The coating process used is e-beam evaporation in combination with low-energy ion-beam smoothening. The reflectance of the coatings, which are covered with a special protective capping layer, is typically around 68%, with a maximum value of 69.6% and a non-correctable figure error added by the full multilayer stack of better than 35 picometer. The results are compared to the earlier coatings of the EUVL Process Development Tool.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
E. Louis, E. D. van Hattum, S. Alonso van der Westen, P. Sallé, K. T. Grootkarzijn, E. Zoethout, F. Bijkerk, G. von Blanckenhagen, S. Müllender, "High reflectance multilayers for EUVL HVM-projection optics", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76362T (22 March 2010); doi: 10.1117/12.846566; https://doi.org/10.1117/12.846566

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