22 March 2010 Cobalt-containing polymers as patterning assist layers in extreme ultraviolet lithography
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Abstract
This paper communicates the use of cobalt-containing polymers in extreme ultra-violet lithography (EUVL). The polymers were synthesized in a two-step process through the complexation of dicobalt octacarbonyl, Co2(CO)8 to a mainchain alkyne-functional polyester obtained by polycondensation protocol. As indicated by thermal analysis, the cobaltcontaining polymers are characterized by a thermal transition around 110 °C assigned to a crosslinking process, a key factor in considering these materials as candidates for patterning assist layers (PAL) in EUVL. Positive and negative impacts of the metal component introduced through PAL upon the resolution, line-width roughness (LWR), and sensitivity (RLS) of the resist were investigated. The potential utility of these materials as wet developable PAL is also described.
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Georgeta Masson, Georgeta Masson, } "Cobalt-containing polymers as patterning assist layers in extreme ultraviolet lithography", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 763631 (22 March 2010); doi: 10.1117/12.846634; https://doi.org/10.1117/12.846634
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