22 March 2010 Tin ion and neutral dynamics within an LPP EUV source
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Abstract
The life-time of normal incidence collectors used in LPP EUV sources has been computationally investigated. A two-dimensional/ axisymmetric hydrodynamic-particle code is used to model the plasma expansion from the laser-droplet interaction up to the collector optic. The plasma is formed from the interaction of a Nd:YAG laser, operating at the fundamental frequency, with 50μm tin droplets. The simulation results show non-uniform mass-density distributions at the end of the laser pulse. As the expansion continues up to the collector, the non-uniformities continue to develop. Sn5+ is the most energetic ion impinging on the collector, with kinetic energies up to 7keV. The sputtering yields for Sn ions onto Mo and Si show a strong dependence on both the ion energy and their impact angle. The deposition of neutral tin atoms on the collector has also been assessed with a large scale hydrodynamic simulation. These results are used to investigate the build-up of tin vapor at the irradiation site.
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Bob Rollinger, Bob Rollinger, Oran Morris, Oran Morris, Ndaona Chokani, Ndaona Chokani, Reza S. Abhari, Reza S. Abhari, } "Tin ion and neutral dynamics within an LPP EUV source", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76363F (22 March 2010); doi: 10.1117/12.846557; https://doi.org/10.1117/12.846557
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