1 April 2010 Self-assembling materials for lithographic patterning: overview, status, and moving forward
Author Affiliations +
Abstract
We survey several different approaches wherein self-assembly has been applied in lithographic patterning. As part of this survey, we trace the evolution of block copolymer directed self-assembly used as lithographic technique, and summarize its current status. We compare a process based on block copolymer lithography with an equivalent process based on spacer pitch division. We conclude with a brief discussion of design issues and future research in the field.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
William Hinsberg, William Hinsberg, Joy Cheng, Joy Cheng, Ho-Cheol Kim, Ho-Cheol Kim, Daniel P. Sanders, Daniel P. Sanders, } "Self-assembling materials for lithographic patterning: overview, status, and moving forward", Proc. SPIE 7637, Alternative Lithographic Technologies II, 76370G (1 April 2010); doi: 10.1117/12.852230; https://doi.org/10.1117/12.852230
PROCEEDINGS
11 PAGES


SHARE
Back to Top