1 April 2010 Field-based simulations of directed self-assembly in a mixed brush system
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Abstract
Self-assembling block copolymer thin films have attracted considerable attention as a promising high resolution lithographic tool due to the 10 nm scale of microdomain ordering and their facility for modulation of size and pattern. However, for block copolymer lithography to be a viable solution for advanced nano-lithographic technologies, several critical requirements need to be satisfied. Our research has focused on developing complementary mixed polymer brush lithography tools satisfying the required criteria, by means of Self-Consistent Field Theory (SCFT) simulations. Specifically, we have concentrated on graphoepitaxial techniques that are widely tested and considered a particularly promising method for controlling the microdomain ordering.
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Su-Mi Hur, Su-Mi Hur, Amalie L. Frischknecht, Amalie L. Frischknecht, Dale L. Huber, Dale L. Huber, Glenn H. Fredrickson, Glenn H. Fredrickson, } "Field-based simulations of directed self-assembly in a mixed brush system", Proc. SPIE 7637, Alternative Lithographic Technologies II, 76370P (1 April 2010); doi: 10.1117/12.848416; https://doi.org/10.1117/12.848416
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