Automating molecular transfer lithography at 25nm on 200mm wafers including site-remote coating of resist on dissolvable templates

Charles D. Schaper

doi:10.1117/12.848402

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2 April 2010 Automating molecular transfer lithography at 25nm on 200mm wafers including site-remote coating of resist on dissolvable templates

Charles D. Schaper

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Proceedings Volume 7637, Alternative Lithographic Technologies II; 76370U (2010) https://doi.org/10.1117/12.848402
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Targeting applications that require resolution of around 25nm on substrates to 200mm, automated equipment is described that performs the molecular transfer lithography process in which water-soluble templates of polyvinyl alcohol, replicated from master topography on silicon, are coated with resist and bonded onto substrates. Moreover, to eliminate the need for handling wet resist, dry bondable epoxy-based resist is demonstrated, which is pre-coated on the templates and shipped to the fabrication facility where the automation equipment is housed thereby improving ease-of-use, efficiency and throughput, while lowering costs.

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Charles D. Schaper "Automating molecular transfer lithography at 25nm on 200mm wafers including site-remote coating of resist on dissolvable templates", Proc. SPIE 7637, Alternative Lithographic Technologies II, 76370U (2 April 2010); https://doi.org/10.1117/12.848402

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