Nanoprobe maskless lithography

Ivo W. Rangelow; Tzvetan Ivanov; Yanko Sarov; Andreas Schuh; Andreas Frank; Hans Hartmann; Jens-Peter Zöllner; Dierdre L. Olynick; V. Kalchenko

doi:10.1117/12.852265

2 April 2010 Nanoprobe maskless lithography

Ivo W. Rangelow, Tzvetan Ivanov, Yanko Sarov, Andreas Schuh, Andreas Frank, Hans Hartmann, Jens-Peter Zöllner, Dierdre L. Olynick, V. Kalchenko

Author Affiliations +

Proceedings Volume 7637, Alternative Lithographic Technologies II; 76370V (2010) https://doi.org/10.1117/12.852265
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Scanning probe-based methods for surface modification and lithography are an emerging method of producing sub 20-nm features for nanoelectronic applications. In this study, we have demonstrated the nanoscale lithography based on patterning of 10 to 50-nm-thick calix[4]arene by electric-field-induced electrostatic scanning probe lithography. The features size control is obtained using electrostatic interactions and depends on the applied bias and speed of the AFM tip. The width of the obtained lines and dots varies from 10 to 60 nm depending on tip-sharpness, tip-substrate separation and tip-bias voltage.

Citation Download Citation

Ivo W. Rangelow, Tzvetan Ivanov, Yanko Sarov, Andreas Schuh, Andreas Frank, Hans Hartmann, Jens-Peter Zöllner, Dierdre L. Olynick, and V. Kalchenko "Nanoprobe maskless lithography", Proc. SPIE 7637, Alternative Lithographic Technologies II, 76370V (2 April 2010); https://doi.org/10.1117/12.852265

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