Multi-shaped beam proof of lithography

Matthias Slodowski; Hans-Joachim Doering; Wolfgang Dorl; Ines A. Stolberg

doi:10.1117/12.846529

2 April 2010 Multi-shaped beam proof of lithography

Matthias Slodowski, Hans-Joachim Doering, Wolfgang Dorl, Ines A. Stolberg

Proceedings Volume 7637, Alternative Lithographic Technologies II; 763715 (2010) https://doi.org/10.1117/12.846529
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

In this paper a full package high throughput multi electron-beam approach, called Multi Shaped Beam (MSB), for applications in mask making as well as direct write will be presented including complex proof-of-lithography results. The basic concept enables a significant exposure shot count reduction for advanced patterns compared to standard Variable Shaped Beam (VSB) systems and allows full pattern flexibility by concurrently using MSB, VSB and Cell Projection (CP). Proof of lithography results will be presented, which have been performed using a fully operational electron-beam lithography system including data path and substrate scanning by x/y-stage movement.

Citation Download Citation

Matthias Slodowski, Hans-Joachim Doering, Wolfgang Dorl, and Ines A. Stolberg "Multi-shaped beam proof of lithography", Proc. SPIE 7637, Alternative Lithographic Technologies II, 763715 (2 April 2010); https://doi.org/10.1117/12.846529

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