3 April 2010 Advances in roll-to-roll imprint lithography for display applications
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Proceedings Volume 7637, Alternative Lithographic Technologies II; 763719 (2010); doi: 10.1117/12.852268
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States
Abstract
A solution to the problems of roll-to-roll lithography on flexible substrates is presented. We have developed a roll-toroll imprint lithography technique to fabricate active matrix transistor backplanes on flexible webs of polyimide that have a blanket material stack of metals, dielectrics, and semiconductors. Imprint lithography produces a multi-level 3- dimensional mask that is then successively etched to pattern the underlying layers into the desired structures. This process, Self-Aligned Imprint Lithography (SAIL), solves the layer-to-layer alignment problem because all masking levels are created with one imprint step. The processes and equipment required for complete roll-to-roll SAIL fabrication will be described. Emphasis will be placed on the advances in the roll-to-roll imprint process which have enabled us to produce working transistor arrays.
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Albert Jeans, Marcia Almanza-Workman, Robert Cobene, Richard Elder, Robert Garcia, Fernando Gomez-Pancorbo, Warren Jackson, Mehrban Jam, Han-Jun Kim, Ohseung Kwon, Hao Luo, John Maltabes, Ping Mei, Craig Perlov, Mark Smith, Carl Taussig, Frank Jeffrey, Steve Braymen, Jason Hauschildt, Kelly Junge, Don Larson, Dan Stieler, "Advances in roll-to-roll imprint lithography for display applications", Proc. SPIE 7637, Alternative Lithographic Technologies II, 763719 (3 April 2010); doi: 10.1117/12.852268; https://doi.org/10.1117/12.852268
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KEYWORDS
Lithography

Photomasks

Etching

Transistors

Coating

Silicon

Polymers

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