2 April 2010 Advances in roll-to-roll imprint lithography for display applications
Author Affiliations +
Abstract
A solution to the problems of roll-to-roll lithography on flexible substrates is presented. We have developed a roll-toroll imprint lithography technique to fabricate active matrix transistor backplanes on flexible webs of polyimide that have a blanket material stack of metals, dielectrics, and semiconductors. Imprint lithography produces a multi-level 3- dimensional mask that is then successively etched to pattern the underlying layers into the desired structures. This process, Self-Aligned Imprint Lithography (SAIL), solves the layer-to-layer alignment problem because all masking levels are created with one imprint step. The processes and equipment required for complete roll-to-roll SAIL fabrication will be described. Emphasis will be placed on the advances in the roll-to-roll imprint process which have enabled us to produce working transistor arrays.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Albert Jeans, Albert Jeans, Marcia Almanza-Workman, Marcia Almanza-Workman, Robert Cobene, Robert Cobene, Richard Elder, Richard Elder, Robert Garcia, Robert Garcia, Fernando Gomez-Pancorbo, Fernando Gomez-Pancorbo, Warren Jackson, Warren Jackson, Mehrban Jam, Mehrban Jam, Han-Jun Kim, Han-Jun Kim, Ohseung Kwon, Ohseung Kwon, Hao Luo, Hao Luo, John Maltabes, John Maltabes, Ping Mei, Ping Mei, Craig Perlov, Craig Perlov, Mark Smith, Mark Smith, Carl Taussig, Carl Taussig, Frank Jeffrey, Frank Jeffrey, Steve Braymen, Steve Braymen, Jason Hauschildt, Jason Hauschildt, Kelly Junge, Kelly Junge, Don Larson, Don Larson, Dan Stieler, Dan Stieler, } "Advances in roll-to-roll imprint lithography for display applications", Proc. SPIE 7637, Alternative Lithographic Technologies II, 763719 (2 April 2010); doi: 10.1117/12.852268; https://doi.org/10.1117/12.852268
PROCEEDINGS
12 PAGES


SHARE
Back to Top