Direct write 3-dimensional nanopatterning using probes

David Pires; Armin Knoll; Urs Duerig; Ute Drechsler; Michel Despont; Heiko Wolf; James Hedrick; Ekmini de Silva

doi:10.1117/12.847290

2 April 2010 Direct write 3-dimensional nanopatterning using probes

David Pires, Armin Knoll, Urs Duerig, Ute Drechsler, Michel Despont, Heiko Wolf, James Hedrick, Ekmini de Silva

Proceedings Volume 7637, Alternative Lithographic Technologies II; 76371E (2010) https://doi.org/10.1117/12.847290
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

A high-resolution probe based patterning method is presented using organic resists that respond to the presence of a hot tip by local material desorption. Thereby arbitrarily shaped patterns can be written in the organic films in the form of a topographic relief. The patterning process is highly reproducible and repeatable enabling the creation complex relief structures with arbitrary texture also in the vertical dimension. The patterns can be readily transferred into silicon using standard RIE technology. The new technique offers a cost-effective and competitive alternative to high-resolution electron-beam lithography in terms of both resolution and speed.

Citation Download Citation

David Pires, Armin Knoll, Urs Duerig, Ute Drechsler, Michel Despont, Heiko Wolf, James Hedrick, and Ekmini de Silva "Direct write 3-dimensional nanopatterning using probes", Proc. SPIE 7637, Alternative Lithographic Technologies II, 76371E (2 April 2010); https://doi.org/10.1117/12.847290

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