2 April 2010 Monitor and self-diagnostic technology for mask e-beam writing system
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The accuracy of image placement and linewidth on masks has become very crucial to the point that even minor variations in exposure parameters require re-works and result in increasing mask cost. In 2006, at the Association of Super-Advanced Electronics Technologies (ASET), Mask Design, Drawing and Inspection technology Research Department (Mask D2I) had launched a 4-year development program for the optimization of mask design, drawing, and inspection to reduce photomask manufacturing cost. An outline of a system to monitor and self-diagnose the process of data transfer, magnetic field change, and vibration during exposure is described here.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
N. Samoto, H. Manabe, O. Wakimoto, S. Iida, H. Hoshi, M. Yamabe, "Monitor and self-diagnostic technology for mask e-beam writing system", Proc. SPIE 7637, Alternative Lithographic Technologies II, 76371K (2 April 2010); doi: 10.1117/12.846266; https://doi.org/10.1117/12.846266


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