PROCEEDINGS VOLUME 7638
SPIE ADVANCED LITHOGRAPHY | 21-25 FEBRUARY 2010
Metrology, Inspection, and Process Control for Microlithography XXIV
Editor Affiliations +
IN THIS VOLUME

16 Sessions, 121 Papers, 0 Presentations, 0 Posters
Inspection I  (6)
LER/LWR  (5)
DBM I  (4)
SEM  (3)
Overlay  (6)
DBM II  (4)
Proceedings Volume 7638 is from: Logo
SPIE ADVANCED LITHOGRAPHY
21-25 February 2010
San Jose, California, United States
Front Matter: Volume 7638
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763801 (2010) https://doi.org/10.1117/12.858565
Invited Session
J. Foucher, N. Rana, C. Dezauzier
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763802 (2010) https://doi.org/10.1117/12.846550
M. Foldyna, A. De Martino, C. Licitra, J. Foucher
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763803 (2010) https://doi.org/10.1117/12.846234
Mask Litho Metro
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763804 (2010) https://doi.org/10.1117/12.846694
Jens Busch, Anne Parge, Rolf Seltmann, Heike Scholtz, Bernd Schultz, Uwe Knappe, Matthias Ruhm, Marc Noot, Dieter Woischke, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763805 (2010) https://doi.org/10.1117/12.848613
Kazuhiko Fukazawa, Toshiaki Kitamura, Shinsuke Takeda, Yoshihiko Fujimori, Yuji Kudo, Shigeru Hirukawa, Kengo Takemasa, Noriaki Kasai, Yuuichiro Yamazaki, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763806 (2010) https://doi.org/10.1117/12.846329
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763807 (2010) https://doi.org/10.1117/12.846618
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763808 (2010) https://doi.org/10.1117/12.848444
Mask Litho Metro and PC
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763809 (2010) https://doi.org/10.1117/12.848388
Bertrand Le Gratiet, Frank Sundermann, Jean Massin, Marianne Decaux, Nicolas Thivolle, Fabrice Baron, Alain Ostrovsky, Cedric Monget, Jean Damien Chapon, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380A (2010) https://doi.org/10.1117/12.845987
Dae Jong Kim, Hyung Won Yoo, Chul Hong Kim, Hak Kwon Lee, Sung Su Kim, Koon Ho Bae, Hedvi Spielberg, Yun Ho Lee, Shimon Levi, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380B (2010) https://doi.org/10.1117/12.848699
Ute Buttgereit, Robert Birkner, Thomas Scheruebl, Sander de Putter, Bernardo Kastrup, Jo Finders
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380D (2010) https://doi.org/10.1117/12.848053
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380E (2010) https://doi.org/10.1117/12.846336
Timothy J. Wiltshire, Bernhard R. Liegl, Emily M. Hwang, Mark R. Lucksinger
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380F (2010) https://doi.org/10.1117/12.846652
Inspection I
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380H (2010) https://doi.org/10.1117/12.846623
Hyunjo Yang, Jungchan Kim, Taehyeong Lee, Areum Jung, Gyun Yoo, Donggyu Yim, Sungki Park, Toshiaki Hasebe, Masahiro Yamamoto
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380I (2010) https://doi.org/10.1117/12.846739
Richard M. Silver, Bryan M. Barnes, Yeungjoon Sohn, Richard Quintanilha, Hui Zhou, Chris Deeb, Mark Johnson, Milton Goodwin, Dilip Patel
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380J (2010) https://doi.org/10.1117/12.850935
Doron Meshulach, Ido Dolev, Yuuichiro Yamazaki, Kenji Tsuchiya, Makoto Kaneko, Kiminori Yoshino, Takayoshi Fujii
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380K (2010) https://doi.org/10.1117/12.848326
Hyung-Seop Kim, Byoung-Ho Lee, Eric Ma, Fei Wang, Yan Zhao, Kenichi Kanai, Hong Xiao, Jack Jau
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380L (2010) https://doi.org/10.1117/12.848066
Nicolas Pic, Christophe Martin, Michel Vitalis, Thierry Calarnou, Daniel Camlay, Catherine Grosjean, Arnaud Lanier, Jost Kames, Alexander Acksel, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380M (2010) https://doi.org/10.1117/12.845591
LER/LWR
Atsushi Hiraiwa, Akio Nishida
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380N (2010) https://doi.org/10.1117/12.846071
Guy Ayal, Eitan Shauly, Shimon Levi, Amit Siany, Ofer Adan, Yosi Shacham-Diamand
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380O (2010) https://doi.org/10.1117/12.846601
Boaz Brill, Shahar Gov, Dani Hak, Valery Sorin, Tal Marcu, Benjamin Bunday
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380P (2010) https://doi.org/10.1117/12.846449
Yoshinori Momonoi, Taro Osabe, Atsuko Yamaguchi, Erin Mclellan Martin, Hajime Koyanagi, Matthew E. Colburn, Kazuyoshi Torii
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380Q (2010) https://doi.org/10.1117/12.846656
S. Babin, K. Bay, M. Machin
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380R (2010) https://doi.org/10.1117/12.848435
DBM I
John S. Villarrubia, Ronald G. Dixson, András E. Vladár
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380S (2010) https://doi.org/10.1117/12.848406
Eitan Shauly, Israel Rotstein, Ishai Schwarzband, Ofer Edan, Shimon Levi
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380T (2010) https://doi.org/10.1117/12.846909
Omprakash Jaiswal, Rakesh Kuncha, Taksh Bharat, Vipin Madangarli, Edward Conrad, James Bruce, Sajan Marokkey
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380U (2010) https://doi.org/10.1117/12.846572
Linyong Pang, Danping Peng, Lin He, Dongxue Chen, Thuc Dam, Vikram Tolani, Aviram Tam, Wolf Staud
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380V (2010) https://doi.org/10.1117/12.848615
New Metrology Applications
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380W (2010) https://doi.org/10.1117/12.848311
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380X (2010) https://doi.org/10.1117/12.848535
Nelson M. Felix, Allen H. Gabor, William A. Muth, Christopher P. Ausschnitt
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76380Y (2010) https://doi.org/10.1117/12.848002
X-ray and Novel
Yoshiyasu Ito, Kazuhiko Omote, Yuko Okazaki, Yoshinori Nakayama, Hiroki Kawada
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763810 (2010) https://doi.org/10.1117/12.846519
Kazuhiko Omote, Yoshiyasu Ito, Yuko Okazaki
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763811 (2010) https://doi.org/10.1117/12.846515
Y. Ishibashi, T. Koike, Y. Yamazaki, Y. Ito, Y. Okazaki, K. Omote
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763812 (2010) https://doi.org/10.1117/12.848193
Diederik Maas, Emile van Veldhoven, Ping Chen, Vadim Sidorkin, Huub Salemink, Emile . van der Drift, Paul Alkemade
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763814 (2010) https://doi.org/10.1117/12.862438
Andrew C. Rudack, Pratibha Singh, J. Christopher Taylor, Vadim Mashevsky
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763815 (2010) https://doi.org/10.1117/12.848400
Inspection II
Ditza Auerbach, Adi Shulman, Moshe Rozentsvige
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763816 (2010) https://doi.org/10.1117/12.846718
Thomas Ku, Jeff LeClaire, Sia Kim Tan, Gek Soon Chua, Ron Bozak, Roy White, Tod Robinson, Michael Archuletta, David Lee
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763817 (2010) https://doi.org/10.1117/12.848283
Alan Carlson, Prasad Bachiraju, Jennifer Clark, Dale Trost
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763818 (2010) https://doi.org/10.1117/12.846688
Oleg Kishkovich, Tom Kielbaso, David Halbmaier
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763819 (2010) https://doi.org/10.1117/12.848432
AFM and Standards
Michael T. Postek, Andras E. Vladar, William Keery, Michael Bishop, Benjamin Bunday, John Allgair
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381B (2010) https://doi.org/10.1117/12.848037
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381C (2010) https://doi.org/10.1117/12.846870
T. V. Vorburger, A. Hilton, R. G. Dixson, N. G. Orji, J. A. Powell, A. J. Trunek, P. G. Neudeck, P. B. Abel
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381D (2010) https://doi.org/10.1117/12.849176
Scatterometry
R. Quintanilha, Y. J. Sohn, B. M. Barnes, R. Silver
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381E (2010) https://doi.org/10.1117/12.846383
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381F (2010) https://doi.org/10.1117/12.846776
Matthew Sendelbach, Alok Vaid, Pedro Herrera, Ted Dziura, Michelle Zhang, Arun Srivatsa
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381G (2010) https://doi.org/10.1117/12.846692
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381H (2010) https://doi.org/10.1117/12.846648
M. Foldyna, C. Licitra, A. De Martino
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381I (2010) https://doi.org/10.1117/12.846445
Prasad Dasari, Jiangtao Hu, Zhuan Liu, Asher Tan, Oleg Kritsun, Catherine Volkman, Chris Bencher
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381J (2010) https://doi.org/10.1117/12.848518
SEM
Kiyoshi Takamasu, Kazuki Kuwabara, Satoru Takahashi, Takeshi Mizuno, Hiroki Kawada
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381K (2010) https://doi.org/10.1117/12.846436
Benjamin Bunday, Aaron Cordes, John Allgair, Daniel Bellido Aguilar, Vasiliki Tileli, Bradley Thiel, Yohanan Avitan, Ram Peltinov, Mayaan Bar-Zvi, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381L (2010) https://doi.org/10.1117/12.846991
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381O (2010) https://doi.org/10.1117/12.846543
Overlay
Prasad Dasari, Nigel Smith, Gary Goelzer, Zhuan Liu, Jie Li, Asher Tan, Chin Hwee Koh
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381P (2010) https://doi.org/10.1117/12.848189
Jacky Huang, Jiarui Hu, Willie Wang, Ya-Ping Lee, Chih-Ming Ke, Tsai-Sheng Gau
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381Q (2010) https://doi.org/10.1117/12.848522
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381R (2010) https://doi.org/10.1117/12.846371
Boo-Hyun Ham, Hyun-Jea Kang, Chan Hwang, Jeong-Ho Yeo, Cheol-Hong Kim, Suk-Woo Nam, Joo-Tae Moon, Martyn Coogans, Arie den Boef, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381S (2010) https://doi.org/10.1117/12.848399
Shoji Hotta, Takumichi Sutani, Akiyuki Sugiyama, Masahiko Ikeno, Atsuko Yamaguchi, Kazuyoshi Torii, Scott Halle, Daniel Moore, Chas Archie
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381T (2010) https://doi.org/10.1117/12.846674
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381U (2010) https://doi.org/10.1117/12.851008
DBM II
Scott Halle, Daniel Moore, Chas Archie, Shoji Hotta, Takumichi Sutani, Akiyuki Sugiyama, Masahiko Ikeno, Atsuko Yamaguchi, Kazuyoshi Torii
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381V (2010) https://doi.org/10.1117/12.846665
Brian S. Ward, Sylvain Berthiaume, Travis Brist, Peter Brooker
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381W (2010) https://doi.org/10.1117/12.847042
Daisuke Hibino, Hiroyuki Shindo, Yuichi Abe, Yutaka Hojyo, Germain Fenger, Thuy Do, Ir Kusnadi, John L. Sturtevant, Peter De Bisschop, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381X (2010) https://doi.org/10.1117/12.846025
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381Y (2010) https://doi.org/10.1117/12.848309
Poster Session
A.-L. Foucher, J. Foucher, L. Dourthe
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76381Z (2010) https://doi.org/10.1117/12.846731
Gaetano Santoro, Dieter Van den Heuvel, Jennifer Braggin, Craig Rosslee, Philippe J. Leray, Shaunee Cheng, Christiane Jehoul, Robert Schreutelkamp, Noam Hillel
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763820 (2010) https://doi.org/10.1117/12.846969
Ted L. Taylor, Paul Shirley, David Dixon, Shoichiro Yanagi, Eri Makimura
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763821 (2010) https://doi.org/10.1117/12.846571
Sonu Maheshwary, Terry Haas, Steve McGarvey
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763822 (2010) https://doi.org/10.1117/12.846700
Brandy Carr, April Evers, Marc Weimer, Brian Smith, Jeff Leith
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763823 (2010) https://doi.org/10.1117/12.846102
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763824 (2010) https://doi.org/10.1117/12.846690
Sarah Riddle Vogt, Cristian Landoni
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763825 (2010) https://doi.org/10.1117/12.846364
Hiroaki Okamoto, Naoshi Sakaguchi, Fuminori Hayano
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763826 (2010) https://doi.org/10.1117/12.848315
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763827 (2010) https://doi.org/10.1117/12.846471
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763828 (2010) https://doi.org/10.1117/12.846560
James Moyne
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763829 (2010) https://doi.org/10.1117/12.848381
Shian-Huan Cooper Chiu, Chin-Lung Lee, Sheng-Hsiung Yu, Kai-Lin Fu, Min-Hin Tung, Po-Chih Chen, Chao-Tien Huang, Chien-Chun Elsie Yu, Chin-Chou K. Huang, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76382A (2010) https://doi.org/10.1117/12.846667
Philippe Leray, David Laidler, Shaunee Cheng, Martyn Coogans, Andreas Fuchs, Mariya Ponomarenko, Maurits van der Schaar, Peter Vanoppen
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76382B (2010) https://doi.org/10.1117/12.848524
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76382C (2010) https://doi.org/10.1117/12.848516
Frank Laske, J. Whittey, K.-D. Roeth, J. McCormack, D. Adam, J. Bender, C. N. Berglund, M. Takac, Seurien Chou
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76382E (2010) https://doi.org/10.1117/12.848343
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76382F (2010) https://doi.org/10.1117/12.845823
Kentaro Kasa, Masafumi Asano, Takahiro Ikeda, Manabu Takakuwa, Nobuhiro Komine, Kazutaka Ishigo
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76382G (2010) https://doi.org/10.1117/12.846344
Sarohan Park, Eun-Ha Lee, Eun-Kyoung Shin, Yoon-Jung Ryu, Hye-Jin Shin, Seung-Hyun Hwang, Hee-Youl Lim, Kyu-Tae Sun, Tae-Seung Eom, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76382H (2010) https://doi.org/10.1117/12.846489
Chulseung Lee, Changjin Bang, Myoungsoo Kim, Hyosang Kang, Dohwa Lee, Woonjae Jeong, Ok-Sung Lim, Seunghoon Yoon, Jaekang Jung, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76382I (2010) https://doi.org/10.1117/12.846321
Tuan-Yen Yu, Jun-Hung Lin, Yong-Fa Huang, Chien-Hao Chen, Chun-Chi Yu, Chin-Chou Kevin Huang, Chien-Jen Huang, David Tien
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76382K (2010) https://doi.org/10.1117/12.846569
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76382L (2010) https://doi.org/10.1117/12.846720
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76382M (2010) https://doi.org/10.1117/12.848539
Chris Sallee, Wayne Clark, Bo Jou Lu, Vladimir Ukraintsev, Vitali Khvatkov
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76382N (2010) https://doi.org/10.1117/12.848619
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76382O (2010) https://doi.org/10.1117/12.846504
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76382P (2010) https://doi.org/10.1117/12.846541
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76382Q (2010) https://doi.org/10.1117/12.846536
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76382R (2010) https://doi.org/10.1117/12.848308
Yukari Nakata, Shunsuke Koshihara, Hiroki Kawada, Kyoungmo Yang, Junichi Kakuta, Akemi Kono
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76382S (2010) https://doi.org/10.1117/12.846320
Benjamin Bunday, Pete Lipscomb, Shunsuke Koshihara, Shigeki Sukegawa, Yasuo Kawai, Yuki Ojima, Andy Self, Lorena Page
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76382U (2010) https://doi.org/10.1117/12.848546
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76382V (2010) https://doi.org/10.1117/12.848331
Keisuke Tanaka, Joungchel Lee
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76382W (2010) https://doi.org/10.1117/12.846641
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76382Y (2010) https://doi.org/10.1117/12.846008
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76382Z (2010) https://doi.org/10.1117/12.848679
Amir Sagiv, Jo Finders, Robert Kazinczi, Andre Engelen, Frank Duray, Ingrid Minnaert-Janssen, Shmoolik Mangan, Dror Kasimov, Ilan Englard
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763830 (2010) https://doi.org/10.1117/12.848376
Jürgen M. Lobert, Philip W. Cate, David J. Ruede, Joseph R. Wildgoose, Charles M. Miller, John C. Gaudreau
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763832 (2010) https://doi.org/10.1117/12.848390
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763833 (2010) https://doi.org/10.1117/12.846412
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763834 (2010) https://doi.org/10.1117/12.846366
Yair Elblinger, Jo Finders, Marcel Demarteau, Onno Wismans, Ingrid Minnaert Janssen, Frank Duray, Michael Ben Yishai, Shmoolik Mangan, Yaron Cohen, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763835 (2010) https://doi.org/10.1117/12.848334
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763836 (2010) https://doi.org/10.1117/12.846633
Donald A. Chernoff, David L. Burkhead
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 763837 (2010) https://doi.org/10.1117/12.846628
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XXIV, 76383B (2010) https://doi.org/10.1117/12.848337
</