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1 April 2010 Application of automated topography focus corrections for volume manufacturing
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Abstract
This work describes the implementation and performance of AGILE focus corrections for advanced photo lithography in volume production as well as advanced development in IBM's 300mm facility. In particular, a logic hierarchy that manages the air gage sub-system corrections to optimize tool productivity while sampling with sufficient frequency to ensure focus accuracy for stable production processes is described. The information reviewed includes: General AGILE implementation approaches; Sample focus correction contours for critical 45nm, 32nm, and 22nm applications; An outline of the IBM Advanced Process Control (APC) logic and system(s) that manage the focus correction sets; Long term, historical focus correction data for stable 45nm processes as well as development stage 32nm processes; Practical issues encountered and possible enhancements to the methodology.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Timothy J. Wiltshire, Bernhard R. Liegl, Emily M. Hwang, and Mark R. Lucksinger "Application of automated topography focus corrections for volume manufacturing", Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 76380F (1 April 2010); https://doi.org/10.1117/12.846652
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