AMC control in photolithography: the past decade in review

Gerald Weineck; Dustin Zastera; Andrew J. Dallas

doi:10.1117/12.847258

1 April 2010 AMC control in photolithography: the past decade in review

Gerald Weineck, Dustin Zastera, Andrew J. Dallas

Proceedings Volume 7638, Metrology, Inspection, and Process Control for Microlithography XXIV; 76383H (2010) https://doi.org/10.1117/12.847258
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

The focus of airborne molecular contamination (AMC) control within the semiconductor industry, specifically photolithography, has changed significantly over the past decade. As the focal point of concern has shifted from ammonia (or base gases), to acid gases, and recently to organic contaminants, the filtration industry has adeptly grown to provide the necessary filtration solutions. This paper attempts to provide an overview of these changes while reviewing the primary contaminants, how they are removed, the control technologies in use, and how they are applied.

Citation Download Citation

Gerald Weineck, Dustin Zastera, and Andrew J. Dallas "AMC control in photolithography: the past decade in review", Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 76383H (1 April 2010); https://doi.org/10.1117/12.847258

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