Translator Disclaimer
1 April 2010 AMC control in photolithography: the past decade in review
Author Affiliations +
The focus of airborne molecular contamination (AMC) control within the semiconductor industry, specifically photolithography, has changed significantly over the past decade. As the focal point of concern has shifted from ammonia (or base gases), to acid gases, and recently to organic contaminants, the filtration industry has adeptly grown to provide the necessary filtration solutions. This paper attempts to provide an overview of these changes while reviewing the primary contaminants, how they are removed, the control technologies in use, and how they are applied.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gerald Weineck, Dustin Zastera, and Andrew J. Dallas "AMC control in photolithography: the past decade in review", Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 76383H (1 April 2010);

Back to Top