Paper
25 March 2010 Comparison of star and linear ArF resists
Drew C. Forman, Florian Wieberger, Andre Gröschel, Axel H. E. Müller, Hans-Werner Schmidt, Christopher K. Ober
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Abstract
Linear and star-shaped ArF photoresists were prepared and preliminary lithographic comparison was performed using electron-beam exposure. An oligo-initiator based on saccharose forms the core of the star shaped photoresist from which three standard ArF photoresist monomers, α-gamma butyrolactone methacrylate (GBLMA), methyl adamantyl methacrylate (MAMA) and hydroxyl adamantyl methacrylate (HAMA) were polymerized. Conditions were adjusted to obtain a low polydispersity, 6 kg/mol star polymer with a degree of polymerization of approximately five mers per arm. For comparison, a linear photoresist control was prepared using the same scheme. The star resist architecture was found to improve roughness without reducing sensitivity or resolution.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Drew C. Forman, Florian Wieberger, Andre Gröschel, Axel H. E. Müller, Hans-Werner Schmidt, and Christopher K. Ober "Comparison of star and linear ArF resists", Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76390P (25 March 2010); https://doi.org/10.1117/12.848344
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Cited by 6 scholarly publications.
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KEYWORDS
Stars

Polymers

Photoresist materials

Line width roughness

Line edge roughness

Polymerization

Statistical analysis

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