29 March 2010 Characteristics of main chain decomposable star shaped polymer on EUV lithography
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Abstract
We prepared three different kinds of polymers. The first was the STAR polymers having various length of the arms connected to the single core which could be decomposed by the acid. The second was the Linear polymers based on p-hydroxystylene (HS) which was also used for the arms of the STAR polymer. The other was the non-decomposable STAR polymer which had a quite similar shape to the STAR polymer and of which core structure could not be decomposed. Using those materials, lithographic performance obtained using a Micro Exposure Tool (MET) was compared with thermal property, and it was found that STAR-9mer-H having the 9 HS unit arms provided best overall performance, 24 nm of ultimate resolution, 4.3 nm of line width roughness and 4.6x10-8 mJ•nm3 of Z factor on MET evaluation. In addition to this, the specific resist based on the STAR polymer could achieve 26 nm resolution with quite wider process window capability that the control resist consisting of partially protected poly(p-hydroxystyrene) on the Alpha Demo Tool evaluation with conventional illumination.
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Taku Hirayama, Taku Hirayama, Jun Iwashita, Jun Iwashita, Sachiko Yoshizawa, Sachiko Yoshizawa, Kenri Konno, Kenri Konno, Takeshi Iwai, Takeshi Iwai, } "Characteristics of main chain decomposable star shaped polymer on EUV lithography", Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76390Q (29 March 2010); doi: 10.1117/12.848439; https://doi.org/10.1117/12.848439
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