Further analysis of the effect of point-of-use filtration on microbridging defectivity

J. Braggin; R. Gronheid; S. Cheng; D. Van den Heuvel; S. Bernard; P. Foubert; C. Rosslee

doi:10.1117/12.843663

29 March 2010 Further analysis of the effect of point-of-use filtration on microbridging defectivity

J. Braggin, R. Gronheid, S. Cheng, D. Van den Heuvel, S. Bernard, P. Foubert, C. Rosslee

Proceedings Volume 7639, Advances in Resist Materials and Processing Technology XXVII; 763917 (2010) https://doi.org/10.1117/12.843663
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

In a 2009 analysis of microbridging defectivity, a design of experiment methodology was used to show the effect of filtration parameters on microbridging defectivity, specifically focusing on filter retention rating, filter media and design, filtration rate, and controlled filtration pressure. In that analysis it was shown that different filter architectures provide the most effective filtration of microbridging and that different filter architectures show different levels of microbridging defects even when optimally tuned. Ultimately, filter choice and filtration setup matter in removal of microbridging defects. In the new analysis, a similar approach was taken with additional filter types. However, in the new study the retention rating of the filters was kept constant at 10nm while other filter parameters were varied, including membrane material and design. This study will show the specific effect of the membrane material and design on microbridging defectivity in addition to the effects of filtration setup.

Citation Download Citation

J. Braggin, R. Gronheid, S. Cheng, D. Van den Heuvel, S. Bernard, P. Foubert, and C. Rosslee "Further analysis of the effect of point-of-use filtration on microbridging defectivity", Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 763917 (29 March 2010); https://doi.org/10.1117/12.843663

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