Evaluation of hydroxyl derivatives for chemically amplified extreme ultraviolet resist

Kikuo Furukawa; Yoshihisa Arai; Hiroki Yamamoto; Takahiro Kozawa; Seiichi Tagawa

doi:10.1117/12.846460

29 March 2010 Evaluation of hydroxyl derivatives for chemically amplified extreme ultraviolet resist

Kikuo Furukawa, Yoshihisa Arai, Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa

Proceedings Volume 7639, Advances in Resist Materials and Processing Technology XXVII; 76391L (2010) https://doi.org/10.1117/12.846460
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Extreme ultraviolet (EUV) lithography is the most favorable process for high volume manufacturing of semiconductor devices at 22nm half-pitch and below. Many efforts have revealed that the phenolic hydroxyl groups of polymers are also an effective proton source in acid generation in EUV resists, and the effective proton generation and the control of the generated acid diffusion are required to improve the breakthrough of the resolution - line width roughness - sensitivity (RLS) trade-off. To clarify the lithographic performance of these derivatives, we synthesized the acrylic terpolymers containing phenolic and alcoholic hydroxyl derivatives as model photopolymers and exposed the resist samples based on these polymers to EUV and electron beam (EB) radiation. On the basis of the lithographic performances of these resist samples, we evaluated the characteristics of phenolic and alcoholic derivatives upon exposure to EUV radiation. We discuss the relationship between the chemical structures of these derivatives and lithographic performance.

Citation Download Citation

Kikuo Furukawa, Yoshihisa Arai, Hiroki Yamamoto, Takahiro Kozawa, and Seiichi Tagawa "Evaluation of hydroxyl derivatives for chemically amplified extreme ultraviolet resist", Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76391L (29 March 2010); https://doi.org/10.1117/12.846460

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