31 March 2010 All-dry processible and PAG-attached molecular glasses for improved lithographic performance
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Proceedings Volume 7639, Advances in Resist Materials and Processing Technology XXVII; 76392C (2010); doi: 10.1117/12.848385
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States
Abstract
As the semiconductor industry moves forward, resolution limits are being pushed to the sub-30 nm regime. In order to meet these demands, radical new resist design and processes must be explored. We have developed a molecular glass system for all-dry processing conditions. Physical vapor deposition (PVD) has been used for film formation onto silicon wafers. PVD deposits a uniform film of controlled thickness free from impurities that are often introduced by casting solvents used in traditional spin coating methods. Thermal development is used as an alternative to processing in solvents in order to prevent resist swelling and pattern collapse by capillary forces. The deposited molecule is designed to crosslink upon E-beam irradiation without additives, and therefore form a homogeneous, single component film. PAG-attached molecular glasses have been synthesized in order to promote film homogeneity as well. By tethering PAG directly to the molecular glass core, issues such as PAG aggregation can be remedied. Acid migration, which increases blur and LER, can also be hindered.
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Marie Krysak, Tristan Kolb, Christian Neuber, Hans-Werner Schmidt, Christopher K. Ober, "All-dry processible and PAG-attached molecular glasses for improved lithographic performance", Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76392C (31 March 2010); doi: 10.1117/12.848385; https://doi.org/10.1117/12.848385
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KEYWORDS
Glasses

Molecules

Magnesium

Polymers

Line edge roughness

Semiconducting wafers

Lithography

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