3 March 2010 Experimental result of polarization characteristics separation method
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The use of high lens numerical aperture for improving the resolution of a lithographic lens requires a high incident angle of exposure light in resist, which induces vectorial effects. As a result, high NA lithography has become more sensitive to vectorial effects, and a vectorial fingerprint with higher accuracy has become necessary for effective image forming simulation. We successfully obtained true polarization characteristics of single optics by separating the effect of measurement optics, arranged serially, in the measurement optical path. Accuracy of the separated polarization characteristics of two test birefringent optics on a testbench for principle verification was calculated to be better than 0.01 nm of OPE simulation error.
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Toru Fujii, Kosuke Suzuki, Jun Kogo, Kiyoshi Toyama, Kunihisa Sasada, Masayasu Sawada, "Experimental result of polarization characteristics separation method", Proc. SPIE 7640, Optical Microlithography XXIII, 76400R (3 March 2010); doi: 10.1117/12.846323; https://doi.org/10.1117/12.846323

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